SURFACE POLISHING DEVICE

PROBLEM TO BE SOLVED: To obtain a surface polishing device excellent in elevation driving performance, which supports an upper platen in a well-balanced manner. SOLUTION: An elevating device 8 driving the elevation of the upper polishing plate 1 between a polishing position and a non-polishing posit...

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Hauptverfasser: YAMATANI AKIHIKO, SHIMIZU TOSHIKUNI, NAKAJO YOSHIHIRO
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creator YAMATANI AKIHIKO
SHIMIZU TOSHIKUNI
NAKAJO YOSHIHIRO
description PROBLEM TO BE SOLVED: To obtain a surface polishing device excellent in elevation driving performance, which supports an upper platen in a well-balanced manner. SOLUTION: An elevating device 8 driving the elevation of the upper polishing plate 1 between a polishing position and a non-polishing position is provided with: three elevation driving mechanism parts 8A operated in synchronization; and a connection mechanism part 8B connecting these elevation driving mechanism parts 8A and the upper polishing plate 1. The elevation driving mechanism parts 8A are disposed in parallel at 120° intervals at positions surrounding the upper polishing plate 1 of a machine body. The connection mechanism part 8B is provided with three connection arms 12 extended in a radial direction at 120° intervals from a supporting part 11 supporting the upper polishing plate 1 and connected with the elevation driving mechanism parts 8A. COPYRIGHT: (C)2008,JPO&INPIT
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fullrecord <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2008018514A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2008018514A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2008018514A3</originalsourceid><addsrcrecordid>eNrjZJAIDg1yc3R2VQjw9_EM9vD0c1dwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWBoYWpoYmjsZEKQIALbsgEw</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>SURFACE POLISHING DEVICE</title><source>esp@cenet</source><creator>YAMATANI AKIHIKO ; SHIMIZU TOSHIKUNI ; NAKAJO YOSHIHIRO</creator><creatorcontrib>YAMATANI AKIHIKO ; SHIMIZU TOSHIKUNI ; NAKAJO YOSHIHIRO</creatorcontrib><description>PROBLEM TO BE SOLVED: To obtain a surface polishing device excellent in elevation driving performance, which supports an upper platen in a well-balanced manner. SOLUTION: An elevating device 8 driving the elevation of the upper polishing plate 1 between a polishing position and a non-polishing position is provided with: three elevation driving mechanism parts 8A operated in synchronization; and a connection mechanism part 8B connecting these elevation driving mechanism parts 8A and the upper polishing plate 1. The elevation driving mechanism parts 8A are disposed in parallel at 120° intervals at positions surrounding the upper polishing plate 1 of a machine body. The connection mechanism part 8B is provided with three connection arms 12 extended in a radial direction at 120° intervals from a supporting part 11 supporting the upper polishing plate 1 and connected with the elevation driving mechanism parts 8A. COPYRIGHT: (C)2008,JPO&amp;INPIT</description><language>eng</language><subject>BASIC ELECTRIC ELEMENTS ; DRESSING OR CONDITIONING OF ABRADING SURFACES ; ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS ; GRINDING ; MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING ; PERFORMING OPERATIONS ; POLISHING ; SEMICONDUCTOR DEVICES ; TRANSPORTING</subject><creationdate>2008</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080131&amp;DB=EPODOC&amp;CC=JP&amp;NR=2008018514A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,776,881,25542,76289</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&amp;date=20080131&amp;DB=EPODOC&amp;CC=JP&amp;NR=2008018514A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>YAMATANI AKIHIKO</creatorcontrib><creatorcontrib>SHIMIZU TOSHIKUNI</creatorcontrib><creatorcontrib>NAKAJO YOSHIHIRO</creatorcontrib><title>SURFACE POLISHING DEVICE</title><description>PROBLEM TO BE SOLVED: To obtain a surface polishing device excellent in elevation driving performance, which supports an upper platen in a well-balanced manner. SOLUTION: An elevating device 8 driving the elevation of the upper polishing plate 1 between a polishing position and a non-polishing position is provided with: three elevation driving mechanism parts 8A operated in synchronization; and a connection mechanism part 8B connecting these elevation driving mechanism parts 8A and the upper polishing plate 1. The elevation driving mechanism parts 8A are disposed in parallel at 120° intervals at positions surrounding the upper polishing plate 1 of a machine body. The connection mechanism part 8B is provided with three connection arms 12 extended in a radial direction at 120° intervals from a supporting part 11 supporting the upper polishing plate 1 and connected with the elevation driving mechanism parts 8A. COPYRIGHT: (C)2008,JPO&amp;INPIT</description><subject>BASIC ELECTRIC ELEMENTS</subject><subject>DRESSING OR CONDITIONING OF ABRADING SURFACES</subject><subject>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</subject><subject>GRINDING</subject><subject>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</subject><subject>PERFORMING OPERATIONS</subject><subject>POLISHING</subject><subject>SEMICONDUCTOR DEVICES</subject><subject>TRANSPORTING</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2008</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZJAIDg1yc3R2VQjw9_EM9vD0c1dwcQ3zdHblYWBNS8wpTuWF0twMSm6uIc4euqkF-fGpxQWJyal5qSXxXgFGBgYWBoYWpoYmjsZEKQIALbsgEw</recordid><startdate>20080131</startdate><enddate>20080131</enddate><creator>YAMATANI AKIHIKO</creator><creator>SHIMIZU TOSHIKUNI</creator><creator>NAKAJO YOSHIHIRO</creator><scope>EVB</scope></search><sort><creationdate>20080131</creationdate><title>SURFACE POLISHING DEVICE</title><author>YAMATANI AKIHIKO ; SHIMIZU TOSHIKUNI ; NAKAJO YOSHIHIRO</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2008018514A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2008</creationdate><topic>BASIC ELECTRIC ELEMENTS</topic><topic>DRESSING OR CONDITIONING OF ABRADING SURFACES</topic><topic>ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS</topic><topic>GRINDING</topic><topic>MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING</topic><topic>PERFORMING OPERATIONS</topic><topic>POLISHING</topic><topic>SEMICONDUCTOR DEVICES</topic><topic>TRANSPORTING</topic><toplevel>online_resources</toplevel><creatorcontrib>YAMATANI AKIHIKO</creatorcontrib><creatorcontrib>SHIMIZU TOSHIKUNI</creatorcontrib><creatorcontrib>NAKAJO YOSHIHIRO</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>YAMATANI AKIHIKO</au><au>SHIMIZU TOSHIKUNI</au><au>NAKAJO YOSHIHIRO</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>SURFACE POLISHING DEVICE</title><date>2008-01-31</date><risdate>2008</risdate><abstract>PROBLEM TO BE SOLVED: To obtain a surface polishing device excellent in elevation driving performance, which supports an upper platen in a well-balanced manner. SOLUTION: An elevating device 8 driving the elevation of the upper polishing plate 1 between a polishing position and a non-polishing position is provided with: three elevation driving mechanism parts 8A operated in synchronization; and a connection mechanism part 8B connecting these elevation driving mechanism parts 8A and the upper polishing plate 1. The elevation driving mechanism parts 8A are disposed in parallel at 120° intervals at positions surrounding the upper polishing plate 1 of a machine body. The connection mechanism part 8B is provided with three connection arms 12 extended in a radial direction at 120° intervals from a supporting part 11 supporting the upper polishing plate 1 and connected with the elevation driving mechanism parts 8A. COPYRIGHT: (C)2008,JPO&amp;INPIT</abstract><oa>free_for_read</oa></addata></record>
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subjects BASIC ELECTRIC ELEMENTS
DRESSING OR CONDITIONING OF ABRADING SURFACES
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
PERFORMING OPERATIONS
POLISHING
SEMICONDUCTOR DEVICES
TRANSPORTING
title SURFACE POLISHING DEVICE
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