PATTERNING DEVICE

PROBLEM TO BE SOLVED: To provide an efficient patterning device and its control arrangement. SOLUTION: A lithography apparatus comprises illumination system, a patterning device PD and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device...

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Bibliographische Detailangaben
Hauptverfasser:	DEKKERS JEROEN-FRANK, MONTAGNE ANTONIUS JOHANNES MARIA, HAGTING MARCUS, VAN DRIEENHUIZEN BERT PIETER, KLATSER PAUL
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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