PATTERNING DEVICE

PROBLEM TO BE SOLVED: To provide an efficient patterning device and its control arrangement. SOLUTION: A lithography apparatus comprises illumination system, a patterning device PD and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	DEKKERS JEROEN-FRANK, MONTAGNE ANTONIUS JOHANNES MARIA, HAGTING MARCUS, VAN DRIEENHUIZEN BERT PIETER, KLATSER PAUL
Format:	Patent
Sprache:	eng
Schlagworte:	ACCESSORIES THEREFOR APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USINGWAVES OTHER THAN OPTICAL WAVES APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FORPROJECTING OR VIEWING THEM APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an efficient patterning device and its control arrangement. SOLUTION: A lithography apparatus comprises illumination system, a patterning device PD and a projection system. The illumination system is configured to condition a beam of radiation. The patterning device PD is configured to pattern the beam of radiation. The patterning device PD comprises a control system CS and an array of individually controllable elements M. The control system CS is configured to convert analog signals having first voltage values to corresponding differential control signals having second higher voltage values. Corresponding ones of the individually controllable elements M in the array of individually controllable elements M are configured to actuate based on receiving a corresponding one of the differential control signals. The projection system is configured to project the patterned beam onto a target area of a substrate. COPYRIGHT: (C)2008,JPO&INPIT