SURFACE ACOUSTIC WAVE ELEMENT AND MANUFACTURING METHOD THEREOF

PROBLEM TO BE SOLVED: To enlarge reflection of a surface acoustic wave by forming an electrode with a lateral side perpendicular to a substrate. SOLUTION: The disclosed manufacturing method includes: a film forming step of forming an electrode metal film 38 on a surface of an LBO wafer 36; a resist...

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Bibliographische Detailangaben
Hauptverfasser: KOBATA TAKESHI, YAMANAKA KUNIHITO
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To enlarge reflection of a surface acoustic wave by forming an electrode with a lateral side perpendicular to a substrate. SOLUTION: The disclosed manufacturing method includes: a film forming step of forming an electrode metal film 38 on a surface of an LBO wafer 36; a resist film forming step of forming a photoresist film 40 on the metal film 38; a mask forming step of exposing and developing the resist film 40 and patterning it in a predetermined shape; an etching step of removing the metal film 38 by irradiating an exposure portion of the metal film 38 with the patterned resist film 40 as a mask with plasma of predetermined gases to expose the LBO wafer 36 and removing a top layer portion of the exposed LBO wafer; and a cleaning step of washing the exposed portion of the LBO wafer with water to remove a damage layer 46, caused by the plasma, generated in the LBO wafer 36. COPYRIGHT: (C)2008,JPO&INPIT