METHOD AND APPARATUS FOR MANUFACTURING COLD MIRROR

PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a cold mirror having excellent illuminance, heat resistance and durability and facilitating the control of vapor deposition rate and film thickness. SOLUTION: The cold mirror is manufactured by sputtering two or more kinds of...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: IDE YOSHIO, ITO HIDENORI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method and apparatus for manufacturing a cold mirror having excellent illuminance, heat resistance and durability and facilitating the control of vapor deposition rate and film thickness. SOLUTION: The cold mirror is manufactured by sputtering two or more kinds of sputtering materials each having different refractive index respectively in a separated film deposition zone while introducing oxidation reactive gas and a sputtering gas to deposit oxide films each having different refractive index on the surface of a processed material. COPYRIGHT: (C)2008,JPO&INPIT