ADSORPTION PAT AND SUBSTRATE TREATMENT DEVICE
PROBLEM TO BE SOLVED: To provide each adsorption pat capable of preventing the sticking of foreign matter which is not desired on the surface of a substrate upon desorption of the substrate in a substrate treatment method where only the surface of the substrate is treated with a chemical, and to pro...
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Format: | Patent |
Sprache: | eng |
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Zusammenfassung: | PROBLEM TO BE SOLVED: To provide each adsorption pat capable of preventing the sticking of foreign matter which is not desired on the surface of a substrate upon desorption of the substrate in a substrate treatment method where only the surface of the substrate is treated with a chemical, and to provide a substrate treatment device comprising the same. SOLUTION: Each adsorption pad used for a substrate treatment device where the substrate is dipped and treated into a solution under a state in which the same is adsorbed with the substrate comprises: the main face adsorbed with the substrate; an external side face arranged along the outer circumference of the substrate; and a suction hole formed at the main face, and, in the cross-sectional shape including the main face and the external side face, the angle made by a line corresponding to the main face and a line corresponding to the external side face is an acute angle. COPYRIGHT: (C)2008,JPO&INPIT |
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