METHOD OF FORMING PATTERN FILM WITH NARROW WIDTH AND THIN-FILM MAGNETIC HEAD HAVING MAGNETIC POLE LAYER WITH NARROW WIDTH
PROBLEM TO BE SOLVED: To provide a method for forming a pattern film, capable of forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching at the end. SOLUTION: The method includes the steps of: forming a base layer in the elem...
Gespeichert in:
Hauptverfasser: | , , , , , , |
---|---|
Format: | Patent |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext bestellen |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!