METHOD OF FORMING PATTERN FILM WITH NARROW WIDTH AND THIN-FILM MAGNETIC HEAD HAVING MAGNETIC POLE LAYER WITH NARROW WIDTH

PROBLEM TO BE SOLVED: To provide a method for forming a pattern film, capable of forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching at the end. SOLUTION: The method includes the steps of: forming a base layer in the elem...

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Bibliographische Detailangaben
Hauptverfasser: YAMANA KENJI, TERASAWA MAKOTO, ITO NORIYUKI, HASEGAWA YASUHIRO, ISOBE MITSUHARU, GOMI HIROTAKA, FUNADA HIROAKI
Format: Patent
Sprache:eng
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