METHOD OF FORMING PATTERN FILM WITH NARROW WIDTH AND THIN-FILM MAGNETIC HEAD HAVING MAGNETIC POLE LAYER WITH NARROW WIDTH

PROBLEM TO BE SOLVED: To provide a method for forming a pattern film, capable of forming a pattern film with a narrower width than the resolution of an exposure machine and a resist used independently of etching at the end. SOLUTION: The method includes the steps of: forming a base layer in the element forming surface of a substrate; forming a first frame layer having end surfaces facing each other across a space having a width W1on the base layer; forming a second frame layer having end surfaces facing each other across a space having a width W2larger than the width W1in the same direction as that of the width W1on the first frame layer, so that the space having the width W2is located right above the space having the width W1; forming a trench-forming film provided with a trench having a minimum width W3smaller than the width W1in the same direction as that of the width W1so as to fill at least a part of the spaces having the width W1and the width W2respectively; and forming a pattern film so as to fill at least a part of the trench. COPYRIGHT: (C)2008,JPO&INPIT