RESIN COMPOSITION, METHOD FOR PATTERN FORMING USING THE SAME, AND METHOD FOR FORMING CAPACITOR

PROBLEM TO BE SOLVED: To provide a polymer resin composition, a method for forming pattern by using the same and a method for forming a capacitor. SOLUTION: The invention relates to the polymer resin composition suitable for forming a blocking membrane, comprising 75-93 mass% of a copolymer composed...

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Bibliographische Detailangaben
Hauptverfasser:	KANG KYONG-RIM, KIM YOUNG-HO, KIM TAE-SUNG, AHN SUN-YUL, KIM JAE-HYUN, YANG JOO-HYUNG
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS MATERIALS THEREFOR METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF INORGANIC OR NON-MACROMOLECULAR ORGANIC SUBSTANCES ASCOMPOUNDING INGREDIENTS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polymer resin composition, a method for forming pattern by using the same and a method for forming a capacitor. SOLUTION: The invention relates to the polymer resin composition suitable for forming a blocking membrane, comprising 75-93 mass% of a copolymer composed of benzylmethacrylate monomer, methacrylic acid monomer and hydroxyethylmethacrylate monomer, 1-7 mass% of a crosslinking agent, 0.01-0.5 mass% of a heat acid generator, 0.01-1 mass% of photo acid generator, 0.00001-0.001 mass% of an organic base and a solvent of the balance mass%. A membrane for blocking a part of a substrate is easily formed by using the polymer resin composition. COPYRIGHT: (C)2008,JPO&INPIT