METHOD AND APPARATUS FOR MANUFACTURING THIN FILM

PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a thin film forming the thin film of a desired thickness, regardless of a coating device forming the thin film. SOLUTION: This method for manufacturing the thin film comprises a thin film forming process forming the thin fi...

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Bibliographische Detailangaben
1. Verfasser:	YOSHIBA HIROSHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BLASTING DRYING DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM HEATING LIGHTING MECHANICAL ENGINEERING PERFORMING OPERATIONS PROCESSES FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL SPRAYING OR ATOMISING IN GENERAL TRANSPORTING WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a method and an apparatus for manufacturing a thin film forming the thin film of a desired thickness, regardless of a coating device forming the thin film. SOLUTION: This method for manufacturing the thin film comprises a thin film forming process forming the thin film layer 110 by coating a base material 100 with a thin film agent; a first film thickness adjusting process varying the thickness of the thin film layer 110 formed in the thin film forming process by permeating the thin film layer 110 into the base material 100; and a second film thickness adjusting process stabilizing the thin film layer 110 varied in the first film thickness adjusting process by drying. COPYRIGHT: (C)2008,JPO&INPIT