METHOD AND SYSTEM MOUNTED ON COMPUTER FOR DETERMINING CONFIGURATION IN LIGHT-SCATTERING INSPECTION SYSTEM

PROBLEM TO BE SOLVED: To provide a system for determining the configuration of a light-scattering inspection system without measuring a wafer by the inspection system. SOLUTION: A method and a system mounted on a computer are composed for determining the configuration of the light-scattering inspect...

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Hauptverfasser: HALLER KURT L, BELYAEV ALEXANDER, KAVALDJIEV DANIEL, SHORTT DAVID, MURALI AMITH, KIRK MIKE D, PETRENKO ALEKSEY, HAAS BRIAN L
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a system for determining the configuration of a light-scattering inspection system without measuring a wafer by the inspection system. SOLUTION: A method and a system mounted on a computer are composed for determining the configuration of the light-scattering inspection system. The method mounted on one computer includes the determination of the three-dimensional map of a signal-to-noise ratio value to a test piece and data to be acquired for the potential defect of the test piece by the light-scattering inspection system over the entire scattering hemisphere of the inspection system. The method includes the determination of one or more parts in the scattering hemisphere, where the signal-to-noise ratio value is higher than that of other parts of the scattering hemisphere, based on the three-dimensional map. The method includes the determination of the configuration of the detection subsystem of the inspection system, based on one or more parts in the scattering hemisphere. COPYRIGHT: (C)2008,JPO&INPIT