IMPRINT LITHOGRAPHY

PROBLEM TO BE SOLVED: To provide novel imprint lithography equipment and a method thereof. SOLUTION: The imprint lithography equipment is provided with a substrate table that supports a lithography substrate 10 and a plurality of print heads 12 provided with a plurality of nozzles 13 configured to d...

Ausführliche Beschreibung

Gespeichert in:

Bibliographische Detailangaben
Hauptverfasser:	WUISTER SANDER F, WISMANS ANTONIUS JOHANNES JOSEPH, PIERIK ANKE, VERNHOUT MARTIN MAURICE, DIJKSMAN JOHAN F
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MANUFACTURE OR TREATMENT THEREOF MATERIALS THEREFOR NANOSTRUCTURES FORMED BY MANIPULATION OF INDIVIDUAL ATOMS,MOLECULES, OR LIMITED COLLECTIONS OF ATOMS OR MOLECULES ASDISCRETE UNITS NANOTECHNOLOGY ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TRANSPORTING
Online-Zugang:	Volltext bestellen
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!

Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide novel imprint lithography equipment and a method thereof. SOLUTION: The imprint lithography equipment is provided with a substrate table that supports a lithography substrate 10 and a plurality of print heads 12 provided with a plurality of nozzles 13 configured to discharge a fluid onto the lithography substrate, wherein the plurality of nozzles 13 extend for a distance substantially equal to or greater than the diameter of the lithography substrate 10 and the plurality of nozzles 13 and the lithography substrate 10 can move relative to each other. COPYRIGHT: (C)2008,JPO&INPIT