PRINTING METHOD, FORMING METHOD OF ELECTRODE PATTERN AND FORMING METHOD OF THIN FILM TRANSISTOR

PROBLEM TO BE SOLVED: To form an ink pattern highly accurately at a specified spot of a base material at the formation of an image pattern made of ink on the base material by a highly definite reversing printing method. SOLUTION: A printing method for forming an ink pattern on the base material is e...

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Hauptverfasser: SEKINE NORIMASA, ISHIZAKI MAMORU
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To form an ink pattern highly accurately at a specified spot of a base material at the formation of an image pattern made of ink on the base material by a highly definite reversing printing method. SOLUTION: A printing method for forming an ink pattern on the base material is equipped with a process for providing an ink layer on a blanket, a process for forming the ink pattern on the blanket by removing the ink in the portion contacting with a convexity pattern in the ink layer on the blanket through the contact of a relief printing plate with the convexity pattern with the blanket and a process for forming a pattern, which is obtained by deducing an ink-repelling pattern from the ink pattern, on the base material by transferring the ink pattern on the blanket through the contact of the base material equipped with the ink-repelling pattern in a non-ink pattern part. COPYRIGHT: (C)2008,JPO&INPIT