REMOTE TYPE PLASMA TREATMENT DEVICE

PROBLEM TO BE SOLVED: To stably keep a regular electrode gap without using an electrode drive mechanism, and to suppress the separation of a solid dielectric layer from an electrode and the generation of particles, in a plasma treatment device of a type for introducing gas into a gap between a pair...

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Bibliographische Detailangaben
Hauptverfasser:	MASUDA MASAAKI, TANGE MASAJI, FUJIOKA YASUMASA
Format:	Patent
Sprache:	eng
Schlagworte:	CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To stably keep a regular electrode gap without using an electrode drive mechanism, and to suppress the separation of a solid dielectric layer from an electrode and the generation of particles, in a plasma treatment device of a type for introducing gas into a gap between a pair of electrodes and activating the gas to exhaust it. SOLUTION: This plasma treatment device 10 is provided with: a first electrode layer 2A; a first ceramic layer 1A for embedding the first electrode layer 2A therein; a second electrode layer 2B; and a second ceramic layer 1B for embedding the second electrode layer therein. A gap 7 is formed between the first surface 1a of the first ceramic layer and the second surface 1c of the second ceramic layer. By using discharging by the application of voltages to the first electrode layer and the second electrode layer, a treatment gas 8 introduced in the gap 7 is activated, and the activated treatment gas 9 is discharged. COPYRIGHT: (C)2008,JPO&INPIT