FILM-FORMING COMPOSITION

PROBLEM TO BE SOLVED: To provide a film-forming composition for producing an insulating film excellent from the viewpoint of film properties such as a dielectric constant or metal diffusion barrier insulation properties. SOLUTION: The film-forming composition comprises at least one solvent selected...

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Bibliographische Detailangaben
1. Verfasser: ADEGAWA YUTAKA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a film-forming composition for producing an insulating film excellent from the viewpoint of film properties such as a dielectric constant or metal diffusion barrier insulation properties. SOLUTION: The film-forming composition comprises at least one solvent selected from among 8-18C hydrocarbons and 4-10C alcohols, where the hydrocarbons and alcohols contain neither a carbonyl site nor an ether linkage site as a substituent group in the molecule. COPYRIGHT: (C)2008,JPO&INPIT