PHOTOSENSITIVE RESIN COMPOSITION, ARTICLE AND METHOD FOR FORMING NEGATIVE TYPE PATTERN

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity, obtaining a large dissolution contrast irrespective to the kind of a polymer precursor, and as a result, obtaining a pattern having a good shape while keeping a sufficient process margin. SOLUTION: This phot...

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Hauptverfasser:	FUKUDA TOSHIHARU, SAKAYORI KATSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CHEMISTRY CINEMATOGRAPHY COMPOSITIONS BASED THEREON ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HETEROCYCLIC COMPOUNDS HOLOGRAPHY MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONSONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS MATERIALS THEREFOR METALLURGY OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORGANIC CHEMISTRY ORGANIC MACROMOLECULAR COMPOUNDS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES THEIR PREPARATION OR CHEMICAL WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive resin composition having high sensitivity, obtaining a large dissolution contrast irrespective to the kind of a polymer precursor, and as a result, obtaining a pattern having a good shape while keeping a sufficient process margin. SOLUTION: This photosensitive resin composition is characterized by containing a salt of a carboxylic acid expressed by formula (1) [wherein, X1, X2are each independently O or S; R1to R9are each independently H, a halogen atom, hydroxy, mercapto, nitro, silyl, silanol or a monovalent organic group; R10to R12are each H or a monovalent organic group, provided that at least one of R10to R12is the monovalent organic group] with an amine, and the polymer precursor. COPYRIGHT: (C)2008,JPO&INPIT