ABRASIVE MATERIAL

PROBLEM TO BE SOLVED: To provide an abrasive material which copes with a low Ra value in texturing processing of a magnetically recording disk etc., and can minimize scratches formed in a machined surface while maintaining a sufficient processing rate, uniform texture impressions, and good sharpness...

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Bibliographische Detailangaben
Hauptverfasser:	TABATA KENICHI, KAMI MAKI
Format:	Patent
Sprache:	eng
Schlagworte:	AFTER-TREATMENT NOT COVERED BY SUBCLASSES C08B, C08C, C08F,C08G CHEMISTRY COMPOSITIONS BASED THEREON DRESSING OR CONDITIONING OF ABRADING SURFACES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GENERAL PROCESSES OF COMPOUNDING GRINDING INFORMATION STORAGE INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORDCARRIER AND TRANSDUCER MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING METALLURGY ORGANIC MACROMOLECULAR COMPOUNDS PERFORMING OPERATIONS PHYSICS POLISHING THEIR PREPARATION OR CHEMICAL WORKING-UP TRANSPORTING WORKING-UP
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an abrasive material which copes with a low Ra value in texturing processing of a magnetically recording disk etc., and can minimize scratches formed in a machined surface while maintaining a sufficient processing rate, uniform texture impressions, and good sharpness. SOLUTION: The abrasive material has a nonwoven fabric mainly formed of extra-fine short fibers having a mean fiber diameter of 5 μm or less, and it is obtained by making a polymer solution and/or radial reactive compound solution coexistent with the nonwoven fabric, and at the same time conducting modification treatment of the nonwoven fabric, for generating a radical species. COPYRIGHT: (C)2008,JPO&INPIT