PARTICLE DEPOSITION METHOD

PROBLEM TO BE SOLVED: To provide a method of efficiently depositing particles inside openings of a resist by scattering the particles on a substrate coated with the resist having the openings. SOLUTION: In the method of depositing particles inside the openings of the resist by scattering the particl...

Ausführliche Beschreibung

Bibliographische Detailangaben

1. Verfasser:	ITABASHI KAZUMITSU
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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