CHEMICAL SOLUTION SUPPLYING APPARATUS AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To provide a chemical solution supplying apparatus, capable of suppressing the mixing of air bubbles into the discharged chemical solution, and to provide a manufacturing method of a semiconductor device, capable of suppressing the occurrence of patterning failure resulting fro...

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Hauptverfasser:	ASAHI KENICHI, TANAKA MIKIHIRO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS FOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TOSURFACES, IN GENERAL APPARATUS SPECIALLY ADAPTED THEREFOR APPLYING LIQUIDS OR OTHER FLUENT MATERIALS TO SURFACES, IN GENERAL BASIC ELECTRIC ELEMENTS CHEMICAL OR PHYSICAL PROCESSES, e.g. CATALYSIS OR COLLOIDCHEMISTRY CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PERFORMING OPERATIONS PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL PHYSICS SEMICONDUCTOR DEVICES SEPARATION SPRAYING OR ATOMISING IN GENERAL THEIR RELEVANT APPARATUS TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a chemical solution supplying apparatus, capable of suppressing the mixing of air bubbles into the discharged chemical solution, and to provide a manufacturing method of a semiconductor device, capable of suppressing the occurrence of patterning failure resulting from the air bubbles mixed into the chemical solution. SOLUTION: A vessel 1, having the chemical solution stored therein, is connected to a filter housing 5 via an introductory pipe 2. A filter 6 is provided on the lower part side of the filter housing 5. The chemical solution is sent out from the vessel 1, to the filter housing 5 by a pump 3. A lyophilic surface 13, having affinity for the chemical solution, is provided on the inner surface of the filter housing 5 above the filter 6. A supplier 9 for supplying the chemical solution to an object via a supply pipe 8, wherein a supply valve 7 for opening/closing the involved passage, is connected to the filter housing 5 below the filter 6. Furthermore, an ejector 12 for externally ejecting the chemical solution is connected to above the filter 6 via an ejection pipe 10, where an ejection valve 11 is interposed for opening/closing the involved passage. COPYRIGHT: (C)2008,JPO&INPIT