SYSTEM AND METHOD FOR MOVING COMPONENT VIA SETPOINT PROFILE, LITHOGRAPHIC DEVICE AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an improved system which handles feed-forward data according to a setpoint profile, in a given type of scan of a lithography device. SOLUTION: The system is for moving a component via a setpoint profile which includes a plurality of target states of the component. Th...

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Hauptverfasser:	VAN DONKELLAR EDWIN TEUNIS, HEERTJES MARCEL FRANCOIS, TSO YIN-TIM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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