SYSTEM AND METHOD FOR MOVING COMPONENT VIA SETPOINT PROFILE, LITHOGRAPHIC DEVICE AND METHOD OF MANUFACTURING DEVICE

PROBLEM TO BE SOLVED: To provide an improved system which handles feed-forward data according to a setpoint profile, in a given type of scan of a lithography device. SOLUTION: The system is for moving a component via a setpoint profile which includes a plurality of target states of the component. Th...

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Hauptverfasser:	VAN DONKELLAR EDWIN TEUNIS, HEERTJES MARCEL FRANCOIS, TSO YIN-TIM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide an improved system which handles feed-forward data according to a setpoint profile, in a given type of scan of a lithography device. SOLUTION: The system is for moving a component via a setpoint profile which includes a plurality of target states of the component. The system includes a displacement device to move the component in accordance with the setpoint profile; a storage device including a library of feedforward data; a signal-generating part, configured to identify a plurality of time segments of the setpoint profile that matches the entries in the library of feedforward data, and access the entries, in order to generate a feedforward signal; and a feedforward control system adapted to control the operation of the displacement device by reference to the feedforward signal generated by the signal-generating part. COPYRIGHT: (C)2007,JPO&INPIT