PHOTOSENSITIVE RESIN COMPOSITION, ARTICLE AND NEGATIVE PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which ensures a high solubility contrast regardless of the kind of polymer precursor, and consequently can provide a pattern of a good profile while retaining a sufficient process margin, and which is inexpensive. SOLUTION: The phot...

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Bibliographische Detailangaben
Hauptverfasser:	FUKUDA TOSHIHARU, SAKAYORI KATSUYA
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR OPTICAL ELEMENTS, SYSTEMS, OR APPARATUS OPTICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which ensures a high solubility contrast regardless of the kind of polymer precursor, and consequently can provide a pattern of a good profile while retaining a sufficient process margin, and which is inexpensive. SOLUTION: The photosensitive resin composition contains an oxime ester derivative (A) containing a structure represented by formula (1') and a polymer precursor, wherein R1and R2are each a hydrogen or a monovalent organic group, they may be the same or different, and these two may bond to each other to form a cyclic structure. COPYRIGHT: (C)2007,JPO&INPIT