METHOD FOR SPECIFYING CUT POSITION AND CUTTING FREQUENCY OF DNA IN CELL CAUSED BY OUTSIDE STRESS BY ONE BASE UNIT

PROBLEM TO BE SOLVED: To provide a method for specifying the cut position of a DNA in a cell formed by an outside stress by one base unit; and also to provide a method for measuring the cut frequency of the DNA in the cell caused by the outside stress by one base unit. SOLUTION: The disclosed is bas...

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Hauptverfasser: SAKAMOTO AYANORI, ONUKI TOSHIHIKO, FUJII ARIOKI, NARUMI KAZUNARI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a method for specifying the cut position of a DNA in a cell formed by an outside stress by one base unit; and also to provide a method for measuring the cut frequency of the DNA in the cell caused by the outside stress by one base unit. SOLUTION: The disclosed is based on a finding that by using the DNA collected from the cells exposed to the outside stress or internally exposed, as a mold and extending by an extending reaction by using a labeled primer, it is possible to obtain labeled fragments having various lengths (fragment length polymorphism) corresponding to the cut position on the DNA when being cut as the results of the exposure to the outside stress or internal exposure. COPYRIGHT: (C)2007,JPO&INPIT