CHEMICAL VAPOR DEPOSITION APPARATUS

PROBLEM TO BE SOLVED: To provide chemical vapor deposition apparatus and a method of using the apparatus. SOLUTION: The chemical vapor deposition apparatus 10 comprises a heating element capable of emitting electromagnetic radiation; a retort 16 positioned relative to the heating element to receive...

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Bibliographische Detailangaben
Hauptverfasser: WEAVER SCOTT ANDREW, RUCKER MICHAEL H, LOU VICTOR LIENKONG, LEWIS DANIEL JOSEPH, DALAKOS GEORGE THEODORE, SAYLOR MATTHEW DAVID
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide chemical vapor deposition apparatus and a method of using the apparatus. SOLUTION: The chemical vapor deposition apparatus 10 comprises a heating element capable of emitting electromagnetic radiation; a retort 16 positioned relative to the heating element to receive the electromagnetic radiation; an encasing member 18 at least partially disposed around the retort 16, the encasing member comprising a material that is at least partially transparent to the electromagnetic radiation; a plenum defined at least in part by an inner surface 24 of the encasing member 18 and an outer surface 22 of the retort 16; and a furnace box 14 at least partially disposed around the encasing member 18 and the retort 16, and housing the heating element. COPYRIGHT: (C)2007,JPO&INPIT