VESSEL OF SEDIMENTARY SLURRY

PROBLEM TO BE SOLVED: To provide a vessel of sedimentary slurry which houses sedimentary slurry such as a polish liquid for polishing a semiconductor wafer or the like, enables easily stirring a sedimentary component by circulation operation with an outer pump, and easily achieves a uniform concentr...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MIYATA KENYO, TAKASAKI NORIHIRO
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To provide a vessel of sedimentary slurry which houses sedimentary slurry such as a polish liquid for polishing a semiconductor wafer or the like, enables easily stirring a sedimentary component by circulation operation with an outer pump, and easily achieves a uniform concentration of the sedimentary component. SOLUTION: The vessel 1A of the sedimentary slurry is constructed such that an approximately cylindrical body part 1 is sealed with a ceiling part 11 and a bottom part 12, and that a take-out opening 3 and a stirring opening 2 are mounted on the ceiling part 11. The stirring opening 2 is arranged in the center of the ceiling part 11, and the take-out opening 3 is arranged in the position by a distance L corresponding to 50 to 90% of an average inner radius R apart from the stirring opening 2 to the body part 1. A discharge pipe 4 having a height h1 of a lower end set at a special height and a suction pipe 5 having a height h2 of a lower end set at a special height are attached to the stirring opening 2 and the take-out opening 3 respectively so that they face to the inner side of the vessel. COPYRIGHT: (C)2007,JPO&INPIT