MASK FOR CHARGED PARTICLE BEAM EXPOSURE, AND PROCESS FOR FABRICATION

PROBLEM TO BE SOLVED: To provide a mask for charged particle exposure along with its process for fabrication capable of forming a square, even if a pattern is micronized while an interval in arrangement of the pattern is not limited. SOLUTION: The mask 1 comprises a circular thin film 5, and the thi...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	YUSA SATOSHI, ARITSUKA YUKI, TAKIGAWA TADAHIKO, ISHIKAWA MIKIO
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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