MULTILAYER-FILM REFLECTING MIRROR, METHOD FOR MANUFACTURING IT, AND EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which has a face contour of high precision. SOLUTION: The multilayer-film reflecting mirror includes a first multilayer film 6 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the sur...

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1. Verfasser: MATSUNARI SHUICHI
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creator MATSUNARI SHUICHI
description PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which has a face contour of high precision. SOLUTION: The multilayer-film reflecting mirror includes a first multilayer film 6 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the surface of a substrate, an intermediate layer 8 which is formed on the surface of the first multilayer film 6 and contains Si or SiO2and a second multilayer film 10 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the surface of the intermediate layer 8. COPYRIGHT: (C)2007,JPO&INPIT
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subjects APPARATUS SPECIALLY ADAPTED THEREFOR
BASIC ELECTRIC ELEMENTS
CINEMATOGRAPHY
ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR
ELECTRICITY
ELECTROGRAPHY
GAMMA RAY OR X-RAY MICROSCOPES
HOLOGRAPHY
IRRADIATION DEVICES
MATERIALS THEREFOR
NUCLEAR ENGINEERING
NUCLEAR PHYSICS
ORIGINALS THEREFOR
PHOTOGRAPHY
PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES
PHYSICS
SEMICONDUCTOR DEVICES
TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
title MULTILAYER-FILM REFLECTING MIRROR, METHOD FOR MANUFACTURING IT, AND EXPOSURE SYSTEM
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