MULTILAYER-FILM REFLECTING MIRROR, METHOD FOR MANUFACTURING IT, AND EXPOSURE SYSTEM

PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which has a face contour of high precision. SOLUTION: The multilayer-film reflecting mirror includes a first multilayer film 6 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the sur...

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Bibliographische Detailangaben
1. Verfasser:	MATSUNARI SHUICHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY GAMMA RAY OR X-RAY MICROSCOPES HOLOGRAPHY IRRADIATION DEVICES MATERIALS THEREFOR NUCLEAR ENGINEERING NUCLEAR PHYSICS ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOTOTHERWISE PROVIDED FOR
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a multilayer-film reflecting mirror which has a face contour of high precision. SOLUTION: The multilayer-film reflecting mirror includes a first multilayer film 6 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the surface of a substrate, an intermediate layer 8 which is formed on the surface of the first multilayer film 6 and contains Si or SiO2and a second multilayer film 10 formed by depositing a layer containing Mo and one containing Si alternately and periodically on the surface of the intermediate layer 8. COPYRIGHT: (C)2007,JPO&INPIT