DEVISE AND METHOD FOR INSPECTING SAMPLE SURFACE SHAPE

PROBLEM TO BE SOLVED: To provide a pattern inspection technology enabling inspecting the surface shape by the inspection device of mirror electron projection type even though the resist material is formed on the sample. SOLUTION: The ultra-violet rays, the wave length (160 to 250 nm) capable of incr...

Ausführliche Beschreibung

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Bibliographische Detailangaben
Hauptverfasser: FURUKAWA TAKASHI, KOYAMA HIKARI
Format: Patent
Sprache:eng
Schlagworte:
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