DEVISE AND METHOD FOR INSPECTING SAMPLE SURFACE SHAPE

PROBLEM TO BE SOLVED: To provide a pattern inspection technology enabling inspecting the surface shape by the inspection device of mirror electron projection type even though the resist material is formed on the sample. SOLUTION: The ultra-violet rays, the wave length (160 to 250 nm) capable of incr...

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Bibliographische Detailangaben
Hauptverfasser:	FURUKAWA TAKASHI, KOYAMA HIKARI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIRCHEMICAL OR PHYSICAL PROPERTIES MEASURING MEASURING ANGLES MEASURING AREAS MEASURING IRREGULARITIES OF SURFACES OR CONTOURS MEASURING LENGTH, THICKNESS OR SIMILAR LINEARDIMENSIONS PHYSICS SEMICONDUCTOR DEVICES TESTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a pattern inspection technology enabling inspecting the surface shape by the inspection device of mirror electron projection type even though the resist material is formed on the sample. SOLUTION: The ultra-violet rays, the wave length (160 to 250 nm) capable of increasing electric conductivity of the surface by irradiating the surface of the resist material of a sample 7, is made incident at a full reflection angle (less than approximately 10 degrees) from an ultraviolet ray source 30 to the sample surface, only the sample surface is made to constitute conductive. COPYRIGHT: (C)2007,JPO&INPIT