SEMICONDUCTOR SUBSTRATE QUALITY EVALUATING METHOD AND SEMICONDUCTOR SUBSTRATE MANUFACTURING METHOD

PROBLEM TO BE SOLVED: To provide a semiconductor substrate quality evaluating method which is excellent in utility. SOLUTION: The semiconductor substrate quality evaluating method includes processes of etching a semiconductor substrate surface and of detecting a bright point on the etched substrate surface using a foreign substance inspection device. The etching is carried out by dry etching, and the quality of the semiconductor substrate is evaluated on the basis of the number of detected bright points and or its distribution pattern. The quality is evaluated for a kind of contaminated metals contained in the substrate, and the kind of the contaminated metals are specified by making an element analysis of the detected bright points. COPYRIGHT: (C)2007,JPO&INPIT