HEAT TREATMENT METHOD, HEAT TREATMENT APPARATUS, AND VAPORIZER

PROBLEM TO BE SOLVED: To provide a heat treatment method and equipment which can reduce the number of particles generated on a heat-treated substrate when water vapor is supplied to the substrate to perform heat treatment. SOLUTION: A vaporizer for supplying water vapor into a heating furnace 1 perf...

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Hauptverfasser: OKURA NARIYUKI, OKABE YASUYUKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a heat treatment method and equipment which can reduce the number of particles generated on a heat-treated substrate when water vapor is supplied to the substrate to perform heat treatment. SOLUTION: A vaporizer for supplying water vapor into a heating furnace 1 performs a two-step vaporization process as follows: the water vapor partially including pure water mist with a small droplet size is supplied in a first vaporizing section 6, and then the water vapor is passed through a thin film of a network structure to capture the pure water mist in a second vaporizing section 7. Thus the fine mist included in the water vapor is reduced. COPYRIGHT: (C)2007,JPO&INPIT