MASK AND METHOD FOR PROCESSING THE SAME

PROBLEM TO BE SOLVED: To keep a mask in a flat state during exposure to achieve high accuracy exposure. SOLUTION: The mask M to be used for an exposure apparatus is processed by a process method including: a step of irradiating a substrate W with pattern exposure light from an irradiating means thro...

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Bibliographische Detailangaben
Hauptverfasser:	GOTO TEI, NAKAMURA TAKESHI
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR CINEMATOGRAPHY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To keep a mask in a flat state during exposure to achieve high accuracy exposure. SOLUTION: The mask M to be used for an exposure apparatus is processed by a process method including: a step of irradiating a substrate W with pattern exposure light from an irradiating means through a flat mask held on a mask stage 1 to transfer a reference pattern of the flat mask onto the substrate W; a step of obtaining a distortion amount δ of the flat mask from the exposure result of the substrate W based on the reference pattern of the flat mask; and a step of processing the mask into a concave form according to the obtained distortion amount δ. COPYRIGHT: (C)2007,JPO&INPIT