OPTICAL CVD APPARATUS AND METHOD OF MANUFACTURING CVD FILM

PROBLEM TO BE SOLVED: To clean a contaminated film in an optical CVD apparatus without lowering the processing speed. SOLUTION: The CVD apparatus comprises a partitioning means 14 having an optical source 20 and a seal 22; a film forming chamber 16 and a cleaning chamber 18 more hermetically partiti...

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Hauptverfasser:	MIYANO JUNICHI, YASUDA KOJI, MATSUMOTO YOSHIIE, SAIKAWA KIYOHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY SEMICONDUCTOR DEVICES SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To clean a contaminated film in an optical CVD apparatus without lowering the processing speed. SOLUTION: The CVD apparatus comprises a partitioning means 14 having an optical source 20 and a seal 22; a film forming chamber 16 and a cleaning chamber 18 more hermetically partitioned by the partitioning means 14 during forming a CVD film; and a rotating means 28 for rotating the optical source to expose a film forming chamber exposing region BM, and a cleaning chamber exposing region BC to the cleaning chamber and the film forming chamber, respectively. The rotating means rotates the optical source during or after forming the CVD film. COPYRIGHT: (C)2007,JPO&INPIT