SUBSTRATE PROCESSING METHOD AND RINSE DEVICE

PROBLEM TO BE SOLVED: To improve a manufacturing yield of a resist pattern by removing unintended level difference of a substrate bevel and a resist film or a protective film of the substrate bevel which causes a source of dust, while securing the tracking ability of an immersion liquid. SOLUTION: A...

Ausführliche Beschreibung

Bibliographische Detailangaben

Hauptverfasser:	TAKEISHI TOMOYUKI, ONISHI KIYONOBU, SHIOBARA HIDESHI, HAYAZAKI KEI, KAWAMURA DAISUKE, ITO SHINICHI, TOUKI TATSUHIKO
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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