LITHOGRAPHIC PROJECTION APPARATUS, SUPPORTING ASSEMBLY, AND METHOD OF MANUFACTURING SAME

PROBLEM TO BE SOLVED: To remove the adverse influence to be exerted upon positioning accuracy of a wafer or a mask. SOLUTION: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces a...

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Hauptverfasser:	VAN BALLEGOIJ ROBERTUS NICODEMUS J, AUER FRANK, CUIJPERS MARTINUS AGNES WILLEM
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS BEARINGS BLASTING CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY ELEMENTS OR CRANKSHAFT MECHANISMS ENGINEERING ELEMENTS AND UNITS FLEXIBLE SHAFTS GENERAL MEASURES FOR PRODUCING AND MAINTAINING EFFECTIVEFUNCTIONING OF MACHINES OR INSTALLATIONS HEATING HOLOGRAPHY LIGHTING MATERIALS THEREFOR MECHANICAL ENGINEERING ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS ROTARY BODIES OTHER THAN GEARING ELEMENTS SEMICONDUCTOR DEVICES SHAFTS THERMAL INSULATION IN GENERAL WEAPONS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To remove the adverse influence to be exerted upon positioning accuracy of a wafer or a mask. SOLUTION: A supporting assembly for use in a lithographic projection apparatus includes a moveable member which is journalled in a housing such that substantially no vibration forces are transmitted between the moveable member and the housing. The assembly comprises a gas filled pressure chamber in which the gas in the pressure chamber acts on the moveable member so as to at least partially counteract the force due to the weight of the moveable member and any other object which it carries. The pressure chamber is supplied with gas and the whole assembly is constructed and arranged such that substantially no gas flows through the pressure chamber when the moveable member is substantially stationary. COPYRIGHT: (C)2007,JPO&INPIT