CERIUM-BASED POLISHING MATERIAL

PROBLEM TO BE SOLVED: To provide a high-purity cerium-based polishing material having a high cerium oxide content, and providing an improved polishing rate. SOLUTION: The cerium-based polishing material having ≥90 mass% content of the cerium oxide based on the total rare earth oxide (TREO) contains...

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Hauptverfasser: URYU HIROMI, UCHINO YOSHIJI
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creator URYU HIROMI
UCHINO YOSHIJI
description PROBLEM TO BE SOLVED: To provide a high-purity cerium-based polishing material having a high cerium oxide content, and providing an improved polishing rate. SOLUTION: The cerium-based polishing material having ≥90 mass% content of the cerium oxide based on the total rare earth oxide (TREO) contains 0.01-2.0 mass% of at least one kind of specific elements selected from Ti and the group 5 to 12 elements having ≤80 atomic number based on the total amount of the polishing material. COPYRIGHT: (C)2007,JPO&INPIT
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subjects ADHESIVES
CHEMISTRY
COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS
DRESSING OR CONDITIONING OF ABRADING SURFACES
DYES
FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS
GRINDING
INORGANIC CHEMISTRY
MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING
MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE
METALLURGY
MISCELLANEOUS APPLICATIONS OF MATERIALS
MISCELLANEOUS COMPOSITIONS
NATURAL RESINS
PAINTS
PERFORMING OPERATIONS
POLISHES
POLISHING
TRANSPORTING
title CERIUM-BASED POLISHING MATERIAL
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