CERIUM-BASED POLISHING MATERIAL

PROBLEM TO BE SOLVED: To provide a high-purity cerium-based polishing material having a high cerium oxide content, and providing an improved polishing rate. SOLUTION: The cerium-based polishing material having ≥90 mass% content of the cerium oxide based on the total rare earth oxide (TREO) contains...

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Bibliographische Detailangaben
Hauptverfasser:	URYU HIROMI, UCHINO YOSHIJI
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMISTRY COMPOUNDS OF THE METALS BERYLLIUM, MAGNESIUM, ALUMINIUM,CALCIUM, STRONTIUM, BARIUM, RADIUM, THORIUM, OR OF THERARE-EARTH METALS DRESSING OR CONDITIONING OF ABRADING SURFACES DYES FEEDING OF GRINDING, POLISHING, OR LAPPING AGENTS GRINDING INORGANIC CHEMISTRY MACHINES, DEVICES, OR PROCESSES FOR GRINDING OR POLISHING MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FORELSEWHERE METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS PAINTS PERFORMING OPERATIONS POLISHES POLISHING TRANSPORTING
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a high-purity cerium-based polishing material having a high cerium oxide content, and providing an improved polishing rate. SOLUTION: The cerium-based polishing material having ≥90 mass% content of the cerium oxide based on the total rare earth oxide (TREO) contains 0.01-2.0 mass% of at least one kind of specific elements selected from Ti and the group 5 to 12 elements having ≤80 atomic number based on the total amount of the polishing material. COPYRIGHT: (C)2007,JPO&INPIT