WAX COPOLYMER AND ITS APPLICATION

PROBLEM TO BE SOLVED: To provide a polymer having a sufficient molecular weight for satisfactory film strength, and a monomer combination suitable for obtaining a property inherent in wax. SOLUTION: The polymer comprises a copolymer of at least two monomers selected from the group consisting of (A)...

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Bibliographische Detailangaben
1. Verfasser:	HEINRICHS FRANZ-LEO
Format:	Patent
Sprache:	eng
Schlagworte:	ADHESIVES CHEMICAL PAINT OR INK REMOVERS CHEMISTRY COATING COMPOSITIONS, e.g. PAINTS, VARNISHES ORLACQUERS COMPOSITIONS BASED THEREON COMPOSITIONS OF MACROMOLECULAR COMPOUNDS CORRECTING FLUIDS DYES FILLING PASTES INKS MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVINGCARBON-TO-CARBON UNSATURATED BONDS METALLURGY MISCELLANEOUS APPLICATIONS OF MATERIALS MISCELLANEOUS COMPOSITIONS NATURAL RESINS ORGANIC MACROMOLECULAR COMPOUNDS PAINTS PASTES OR SOLIDS FOR COLOURING OR PRINTING POLISHES POLISHING COMPOSITIONS OTHER THAN FRENCH POLISH SKI WAXES THEIR PREPARATION OR CHEMICAL WORKING-UP USE OF MATERIALS THEREFOR WOODSTAINS
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Beschreibung
Zusammenfassung:	PROBLEM TO BE SOLVED: To provide a polymer having a sufficient molecular weight for satisfactory film strength, and a monomer combination suitable for obtaining a property inherent in wax. SOLUTION: The polymer comprises a copolymer of at least two monomers selected from the group consisting of (A) an acrylic acid ester/methacrylic acid ester, (B) an ethylenic unsaturated acid, for example, an acrylic acid, a methacrylic acid, and an itaconic acid, (C) a styrene or a styrene derivative, (D) a bifunctional or trifunctional ethylenic unsaturated compound, for example, divinylbenzen, glycol diacrylate, and TMP triacrylate; (E) a vinyl ether and (F) a polymeric wax ((F) is required to be contained in the copolymer in an amount of at least 1 wt.%). COPYRIGHT: (C)2007,JPO&INPIT