PHOTOSENSITIVE RESIN COMPOSITION AND ARTICLE

PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which shows a great contrast of a solubility rate regardless of the kind of a polymer precursor, especially of a polyimide precursor, and consequently can give a pattern with an excellent shape at a low cost while retaining a suffic...

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Hauptverfasser: FUKUDA TOSHIHARU, SAKAYORI KATSUYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a photosensitive resin composition which shows a great contrast of a solubility rate regardless of the kind of a polymer precursor, especially of a polyimide precursor, and consequently can give a pattern with an excellent shape at a low cost while retaining a sufficient process margin. SOLUTION: The photosensitive resin composition comprises benzhydryl ammonium salt of formula (1) and a polymer precursor. In the formula, R1-R13are each independently hydrogen or a monovalent organic group. R14is hydrogen or a monovalent organic group. A is a compound or an element which can become an anion. COPYRIGHT: (C)2007,JPO&INPIT