EXPOSURE METHOD AND DEVICE AND MANUFACTURING METHOD FOR DEVICE

PROBLEM TO BE SOLVED: To provide an exposure method and device for improving a throughput, and also to provide a device manufacturing method for manufacturing the device by using the exposure method or the device. SOLUTION: The image surface of a projection optical system PL is detected at a fixed n...

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Bibliographische Detailangaben

1. Verfasser:	KAWAKUBO SHOJI
Format:	Patent
Sprache:	eng
Schlagworte:	BASIC ELECTRIC ELEMENTS ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY SEMICONDUCTOR DEVICES
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