EXPOSURE METHOD AND DEVICE AND MANUFACTURING METHOD FOR DEVICE

PROBLEM TO BE SOLVED: To provide an exposure method and device for improving a throughput, and also to provide a device manufacturing method for manufacturing the device by using the exposure method or the device. SOLUTION: The image surface of a projection optical system PL is detected at a fixed number of detecting points set in an exposure region by using a space-image measuring device 20 fitted to a wafer stage WST, before starting an exposure treatment transferring a pattern DP formed to a reticle R onto a wafer W through the projection optical system PL, and an AF surface is calibrated as a reference fitting together in the surface of the wafer W. The image surface of the projection optical system PL is detected at the detecting points being contained in a plurality of the detecting points set in the exposure region, and being smaller than a fixed number during the exposure treatment, and the AF surface is calibrated. COPYRIGHT: (C)2007,JPO&INPIT