INTEGRATED CIRCUIT INCLUDING MICRO-MACHINE SWITCH, MANUFACTURING METHOD OF INTEGRATED CIRCUIT, AND ELECTRONIC CIRCUIT INCLUDING INTEGRATED CIRCUIT

PROBLEM TO BE SOLVED: To provide a MEMS switch for which a standard CMOS process is applicable, and its manufacturing method. SOLUTION: This integrated circuit is formed by a CMOS process, and includes circuit parts (301 to 303) and at least one micro-machine switch. At least the one switch has an a...

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1. Verfasser: PALLARES CUXART JOFRE
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide a MEMS switch for which a standard CMOS process is applicable, and its manufacturing method. SOLUTION: This integrated circuit is formed by a CMOS process, and includes circuit parts (301 to 303) and at least one micro-machine switch. At least the one switch has an actuator electrode (11) corresponding to a first conductive layer, at least one contact electrode (21, 22) corresponding to a second conductive layer, and a movable conductive element (31) corresponding to a third conductive layer. Moreover, this relates to the manufacturing method of the integrated circuit having the switch, and a circuit incorporating the switch. COPYRIGHT: (C)2007,JPO&INPIT