PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS
PROBLEM TO BE SOLVED: To provide a plasma treatment device, capable of efficiently carrying out plasma treatment on a plurality of treating surfaces using simple equipment requiring small space. SOLUTION: The plasma treatment head 10 comprises at least a pair of electrodes 12, 14 mutually facing eac...
Gespeichert in:
| 1. Verfasser: | |
|---|---|
| Format: | Patent |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext bestellen |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | |
|---|---|
| container_issue | |
| container_start_page | |
| container_title | |
| container_volume | |
| creator | IWANE KAZUYOSHI |
| description | PROBLEM TO BE SOLVED: To provide a plasma treatment device, capable of efficiently carrying out plasma treatment on a plurality of treating surfaces using simple equipment requiring small space. SOLUTION: The plasma treatment head 10 comprises at least a pair of electrodes 12, 14 mutually facing each other, and a plurality of jet ports 11a, 11b communicating with a space 11x (hereinafter, called "discharge space") between the electrodes 12, 14. The plurality of jet ports 11a, 11b are arranged so as to face respectively different areas 1a, 1b of the treating object 1. By impressing a voltage on the electrodes 12, 14, electric discharge is generated in the discharge space 11x and the treating gas, which is made to pass the discharge space 11a and has become plasmatic is made to flow out to different directions from the plurality of jet ports 11a, 11b, and the treatment gas contacts respectively the different treating areas 1a, 1b of the treating object 1, facing the jet ports 11a, 11b, and the treating areas 1a, 1b are plasma-treated. COPYRIGHT: (C)2007,JPO&INPIT |
| format | Patent |
| fullrecord | <record><control><sourceid>epo_EVB</sourceid><recordid>TN_cdi_epo_espacenet_JP2007115618A</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>JP2007115618A</sourcerecordid><originalsourceid>FETCH-epo_espacenet_JP2007115618A3</originalsourceid><addsrcrecordid>eNrjZLAI8HEM9nVUCAlydQzxdfULUXBxDfN0dlVwilQI9vRz93FV8HB1dNFRCPAJDXL0UfByDVEI8A8KCeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBuaGhqZmhhaOxkQpAgCQ3SiZ</addsrcrecordid><sourcetype>Open Access Repository</sourcetype><iscdi>true</iscdi><recordtype>patent</recordtype></control><display><type>patent</type><title>PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS</title><source>esp@cenet</source><creator>IWANE KAZUYOSHI</creator><creatorcontrib>IWANE KAZUYOSHI</creatorcontrib><description>PROBLEM TO BE SOLVED: To provide a plasma treatment device, capable of efficiently carrying out plasma treatment on a plurality of treating surfaces using simple equipment requiring small space. SOLUTION: The plasma treatment head 10 comprises at least a pair of electrodes 12, 14 mutually facing each other, and a plurality of jet ports 11a, 11b communicating with a space 11x (hereinafter, called "discharge space") between the electrodes 12, 14. The plurality of jet ports 11a, 11b are arranged so as to face respectively different areas 1a, 1b of the treating object 1. By impressing a voltage on the electrodes 12, 14, electric discharge is generated in the discharge space 11x and the treating gas, which is made to pass the discharge space 11a and has become plasmatic is made to flow out to different directions from the plurality of jet ports 11a, 11b, and the treatment gas contacts respectively the different treating areas 1a, 1b of the treating object 1, facing the jet ports 11a, 11b, and the treating areas 1a, 1b are plasma-treated. COPYRIGHT: (C)2007,JPO&INPIT</description><language>eng</language><subject>CHEMICAL SURFACE TREATMENT ; CHEMISTRY ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL ; COATING MATERIAL WITH METALLIC MATERIAL ; COATING METALLIC MATERIAL ; DIFFUSION TREATMENT OF METALLIC MATERIAL ; ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ; ELECTRICITY ; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL ; METALLURGY ; PLASMA TECHNIQUE ; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS ; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS ; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><creationdate>2007</creationdate><oa>free_for_read</oa><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070510&DB=EPODOC&CC=JP&NR=2007115618A$$EHTML$$P50$$Gepo$$Hfree_for_read</linktohtml><link.rule.ids>230,308,780,885,25562,76317</link.rule.ids><linktorsrc>$$Uhttps://worldwide.espacenet.com/publicationDetails/biblio?FT=D&date=20070510&DB=EPODOC&CC=JP&NR=2007115618A$$EView_record_in_European_Patent_Office$$FView_record_in_$$GEuropean_Patent_Office$$Hfree_for_read</linktorsrc></links><search><creatorcontrib>IWANE KAZUYOSHI</creatorcontrib><title>PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS</title><description>PROBLEM TO BE SOLVED: To provide a plasma treatment device, capable of efficiently carrying out plasma treatment on a plurality of treating surfaces using simple equipment requiring small space. SOLUTION: The plasma treatment head 10 comprises at least a pair of electrodes 12, 14 mutually facing each other, and a plurality of jet ports 11a, 11b communicating with a space 11x (hereinafter, called "discharge space") between the electrodes 12, 14. The plurality of jet ports 11a, 11b are arranged so as to face respectively different areas 1a, 1b of the treating object 1. By impressing a voltage on the electrodes 12, 14, electric discharge is generated in the discharge space 11x and the treating gas, which is made to pass the discharge space 11a and has become plasmatic is made to flow out to different directions from the plurality of jet ports 11a, 11b, and the treatment gas contacts respectively the different treating areas 1a, 1b of the treating object 1, facing the jet ports 11a, 11b, and the treating areas 1a, 1b are plasma-treated. COPYRIGHT: (C)2007,JPO&INPIT</description><subject>CHEMICAL SURFACE TREATMENT</subject><subject>CHEMISTRY</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</subject><subject>COATING MATERIAL WITH METALLIC MATERIAL</subject><subject>COATING METALLIC MATERIAL</subject><subject>DIFFUSION TREATMENT OF METALLIC MATERIAL</subject><subject>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</subject><subject>ELECTRICITY</subject><subject>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</subject><subject>METALLURGY</subject><subject>PLASMA TECHNIQUE</subject><subject>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</subject><subject>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</subject><subject>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</subject><fulltext>true</fulltext><rsrctype>patent</rsrctype><creationdate>2007</creationdate><recordtype>patent</recordtype><sourceid>EVB</sourceid><recordid>eNrjZLAI8HEM9nVUCAlydQzxdfULUXBxDfN0dlVwilQI9vRz93FV8HB1dNFRCPAJDXL0UfByDVEI8A8KCeZhYE1LzClO5YXS3AxKbq4hzh66qQX58anFBYnJqXmpJfFeAUYGBuaGhqZmhhaOxkQpAgCQ3SiZ</recordid><startdate>20070510</startdate><enddate>20070510</enddate><creator>IWANE KAZUYOSHI</creator><scope>EVB</scope></search><sort><creationdate>20070510</creationdate><title>PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS</title><author>IWANE KAZUYOSHI</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-epo_espacenet_JP2007115618A3</frbrgroupid><rsrctype>patents</rsrctype><prefilter>patents</prefilter><language>eng</language><creationdate>2007</creationdate><topic>CHEMICAL SURFACE TREATMENT</topic><topic>CHEMISTRY</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL</topic><topic>COATING MATERIAL WITH METALLIC MATERIAL</topic><topic>COATING METALLIC MATERIAL</topic><topic>DIFFUSION TREATMENT OF METALLIC MATERIAL</topic><topic>ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR</topic><topic>ELECTRICITY</topic><topic>INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL</topic><topic>METALLURGY</topic><topic>PLASMA TECHNIQUE</topic><topic>PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS</topic><topic>PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS</topic><topic>SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION</topic><toplevel>online_resources</toplevel><creatorcontrib>IWANE KAZUYOSHI</creatorcontrib><collection>esp@cenet</collection></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>IWANE KAZUYOSHI</au><format>patent</format><genre>patent</genre><ristype>GEN</ristype><title>PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS</title><date>2007-05-10</date><risdate>2007</risdate><abstract>PROBLEM TO BE SOLVED: To provide a plasma treatment device, capable of efficiently carrying out plasma treatment on a plurality of treating surfaces using simple equipment requiring small space. SOLUTION: The plasma treatment head 10 comprises at least a pair of electrodes 12, 14 mutually facing each other, and a plurality of jet ports 11a, 11b communicating with a space 11x (hereinafter, called "discharge space") between the electrodes 12, 14. The plurality of jet ports 11a, 11b are arranged so as to face respectively different areas 1a, 1b of the treating object 1. By impressing a voltage on the electrodes 12, 14, electric discharge is generated in the discharge space 11x and the treating gas, which is made to pass the discharge space 11a and has become plasmatic is made to flow out to different directions from the plurality of jet ports 11a, 11b, and the treatment gas contacts respectively the different treating areas 1a, 1b of the treating object 1, facing the jet ports 11a, 11b, and the treating areas 1a, 1b are plasma-treated. COPYRIGHT: (C)2007,JPO&INPIT</abstract><oa>free_for_read</oa></addata></record> |
| fulltext | fulltext_linktorsrc |
| identifier | |
| ispartof | |
| issn | |
| language | eng |
| recordid | cdi_epo_espacenet_JP2007115618A |
| source | esp@cenet |
| subjects | CHEMICAL SURFACE TREATMENT CHEMISTRY COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATIONOR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY IONIMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL COATING MATERIAL WITH METALLIC MATERIAL COATING METALLIC MATERIAL DIFFUSION TREATMENT OF METALLIC MATERIAL ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR ELECTRICITY INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION INGENERAL METALLURGY PLASMA TECHNIQUE PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OFNEUTRONS PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMICBEAMS SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THESURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION |
| title | PLASMA TREATMENT DEVICE BY SINGLE HEAD, PLURAL JET PORTS |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-14T13%3A36%3A52IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-epo_EVB&rft_val_fmt=info:ofi/fmt:kev:mtx:patent&rft.genre=patent&rft.au=IWANE%20KAZUYOSHI&rft.date=2007-05-10&rft_id=info:doi/&rft_dat=%3Cepo_EVB%3EJP2007115618A%3C/epo_EVB%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_id=info:pmid/&rfr_iscdi=true |