SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To suppress the high electric field of an insulting film in contact with a thin-film resistor. SOLUTION: When a voltage V is applied between aluminum electrodes 45a, 45b in a second layer, current flows to the side of an electrode pattern 43a from that of an electrode pattern 4...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Hauptverfasser: MIZUNO SHOJI, IWAMORI NORIYUKI, NAKAYAMA YOSHIAKI
Format: Patent
Sprache:eng
Schlagworte:
Online-Zugang:Volltext bestellen
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
Beschreibung
Zusammenfassung:PROBLEM TO BE SOLVED: To suppress the high electric field of an insulting film in contact with a thin-film resistor. SOLUTION: When a voltage V is applied between aluminum electrodes 45a, 45b in a second layer, current flows to the side of an electrode pattern 43a from that of an electrode pattern 43b for functioning as a resistor. In this case, the aluminum electrode 45b of the second layer is positioned at the upper portion of a CrSi film 41 via a third TEOS film 44, thus applying the side of high potential V to the CrSi film 41. The application of a large voltage between the CrSi film 41 and the aluminum electrode 45b is prevented. COPYRIGHT: (C)2007,JPO&INPIT