PATTERN FORMING MATERIAL, PATTERN FORMING APPARATUS AND PATTERN FORMING METHOD

PROBLEM TO BE SOLVED: To provide a pattern forming material having excellent storage stability, high sensitivity and high resolution, excellent in tenting property, pattern profile and developability, exhibiting good peelability in etching, and capable of forming a high-definition pattern, and a pattern forming apparatus equipped with the pattern forming material and a pattern forming method using the pattern forming material. SOLUTION: The pattern forming material has at least a support and a photosensitive layer on the support, wherein the photosensitive layer contains at least a binder, a polymerizable compound, a photopolymerization initiator and a polymerization inhibitor, wherein the polymerization inhibitor contains (A) a compound having a phenolic hydroxyl group and (B) a compound having no phenol group in an A to B mass ratio of 0.01-100. The pattern forming apparatus and the pattern forming method are also provided. The compound having no phenol group in the polymerization inhibitor is preferably a compound having an imino group, and the content of the polymerization inhibitor is preferably 65-300 ppm. COPYRIGHT: (C)2007,JPO&INPIT