DEVICE AND METHOD FOR MEASURING IN-PIXEL FILM THICKNESS

PROBLEM TO BE SOLVED: To provide an in-pixel film thickness measuring device capable of discriminating a measuring pixel according to an object to be measured on the basis of optical information, and moving a measuring head. SOLUTION: This film thickness measuring device is a device having a measuri...

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Bibliographische Detailangaben
Hauptverfasser: FUJIWARA YUTAKA, NAKAKUKI HIDEKI
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an in-pixel film thickness measuring device capable of discriminating a measuring pixel according to an object to be measured on the basis of optical information, and moving a measuring head. SOLUTION: This film thickness measuring device is a device having a measuring head which irradiates with light a sample surface having a patterned thin film formed on a substrate, and obtains return light from the sample, a spectroscope for acquiring spectral reflectance data by measuring the return light, and a film-thickness calculation portion for calculating the film thickness of the thin film from the spectral reflectance data. The measuring head of the in-pixel film thickness measuring device has an observing illuminating optical means for emitting light for discriminating a pixel to be an object of film thickness measurement, a measuring illuminating optical means for irradiating a discriminated pixel with light for film-thickness measurement, beam splitters each for branching return light from inside the pixel into two by a predetermined ratio, an imaging means for imaging return light of the observing illuminating optical means, and an image-forming optical means for forming an image of the return light on the spectroscope and the light-receiving element of the imaging means. COPYRIGHT: (C)2007,JPO&INPIT