PATTERN FORMING METHOD AND MANUFACTURING METHOD OF SEMICONDUCTOR DEVICE

PROBLEM TO BE SOLVED: To effectively remove unreacted photo-acid generating agent and acid trap agent segregated in a watermark region in liquid immersion exposure, and suppress a development defect and dimensional accuracy degradation. SOLUTION: In this pattern forming method, after a chemical ampl...

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Bibliographische Detailangaben

Hauptverfasser:	TAKEISHI TOMOYUKI, ONISHI KIYONOBU, KAWAMURA DAISUKE
Format:	Patent
Sprache:	eng
Schlagworte:	APPARATUS SPECIALLY ADAPTED THEREFOR BASIC ELECTRIC ELEMENTS CINEMATOGRAPHY ELECTRIC SOLID STATE DEVICES NOT OTHERWISE PROVIDED FOR ELECTRICITY ELECTROGRAPHY HOLOGRAPHY MATERIALS THEREFOR ORIGINALS THEREFOR PHOTOGRAPHY PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES,e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTORDEVICES PHYSICS SEMICONDUCTOR DEVICES
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