INSPECTION APPARATUS AND INSPECTION METHOD

PROBLEM TO BE SOLVED: To provide an inspection apparatus capable of concretely specifying the kind of abnormality in an object to be inspected which is determined to be abnormal (defective). SOLUTION: The inspection apparatus extracts a feature quantity from a waveform signal acquired from the objec...

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Bibliographische Detailangaben
Hauptverfasser: KUMAMOTO HIROSHI, HIRAYAMA YUJI, SHIMIZU ATSUSHI, FUNAKOSHI AYA
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an inspection apparatus capable of concretely specifying the kind of abnormality in an object to be inspected which is determined to be abnormal (defective). SOLUTION: The inspection apparatus extracts a feature quantity from a waveform signal acquired from the object to be inspected and judges a state based on the extracted feature quantity. An abnormality detecting section 4 of the inspection apparatus comprises: a first layer judging section 11 which judges as to whether the object to be inspected is normal or abnormal, based on a vibration level; a second layer judging section 12 which makes such the judgment that the cause of abnormality is an abnormality in a resonance system, if an impulsive component is large and its center deviation is small, in the case the object to be inspected is judged to be abnormal by the first layer judging section; a third layer judging section 13 which specifies the cause of abnormality based on a frequency-axis component, in the case the second layer judging section makes such the judgment that another cause of abnormality exists; and an output means which outputs a result of judgement made by each judging section. COPYRIGHT: (C)2007,JPO&INPIT