ORGANIC VAPOR DEPOSITION SOURCE AND METHOD FOR CONTROLLING HEAT SOURCE THEREOF

PROBLEM TO BE SOLVED: To provide an organic vapor deposition source which prevents a vaporizing substance from being solidified at a nozzle by minimizing a period of time necessary for a deposition rate to be stabilized and enhancing the efficiency of vapor deposition, and to provide a method for co...

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Hauptverfasser: JEONG MIN JAE, JEONG SEOK-HEON, KIM DOKON
Format: Patent
Sprache:eng
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Zusammenfassung:PROBLEM TO BE SOLVED: To provide an organic vapor deposition source which prevents a vaporizing substance from being solidified at a nozzle by minimizing a period of time necessary for a deposition rate to be stabilized and enhancing the efficiency of vapor deposition, and to provide a method for controlling a heat source. SOLUTION: The organic vapor deposition source 100 has: a crucible 10 which is arranged in a deposition chamber and evaporates an organic substance accommodated therein; a heating section 30 which includes the heating source for supplying heat to the crucible 10; a housing 50 for shielding heat radiated from a heating section 30; an external wall 70 for safely accommodating the crucible 10 therein; and a nozzle section 90 for spouting a substance evaporated from the crucible 10. The heating section 30 comprises: an upper heating part and a lower heating part which are placed in the upper part and the lower part of the crucible 10 respectively; and a first power source for supplying an electric power to the upper heating part and a second power source for supplying an electric power to the lower heating part. COPYRIGHT: (C)2007,JPO&INPIT